Stone working – Sawing – Rotary
Patent
1997-11-07
1999-07-27
Scherbel, David A.
Stone working
Sawing
Rotary
125 1301, B28D 104
Patent
active
059272635
ABSTRACT:
In a method for manufacturing completely circular wafers, a specified crystal orientation of a cylindrical semiconductor crystal member is detected, and a support is mounted on the semiconductor crystal member in accordance with the detected specified crystal orientation. Then, a recognition mark is marked on a top face of the semiconductor crystal member in accordance with a position of the support. Then, the semiconductor crystal member and the support are cut to form a semiconductor wafer and a support piece. Finally, the semiconductor wafer is separated from the support piece.
REFERENCES:
patent: 3838678 (1974-10-01), Kumada et al.
patent: 4227348 (1980-10-01), Demers
patent: 4420909 (1983-12-01), Steere, Jr.
patent: 4971021 (1990-11-01), Kubotera et al.
patent: 5201305 (1993-04-01), Takeuchi
patent: 5287843 (1994-02-01), Katayama et al.
patent: 5313741 (1994-05-01), Toyama
patent: 5383444 (1995-01-01), Kimura
patent: 5458526 (1995-10-01), Tsukada et al.
patent: 5667423 (1997-09-01), Itoi
patent: 5681204 (1997-10-01), Kawaguchi et al.
patent: 5716876 (1998-02-01), Muramatsu
Banks Derris Holt
NEC Corporation
Scherbel David A.
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