Etching a substrate: processes – Forming or treating an article whose final configuration has...
Patent
1997-07-28
1999-04-20
Breneman, Bruce
Etching a substrate: processes
Forming or treating an article whose final configuration has...
216 39, 216 88, 445 50, H01J 902
Patent
active
058955801
ABSTRACT:
A cold cathode emitter structure is described together with two methods for manufacturing it. These methods are cost effective and relatively simple to implement. A key feature is the incorporation of chemical-mechanical polishing into the process. This allows the micro-cones, that serve as cold cathodes, to be easily positioned so that their apexes are located at the correct height relative to the gate lines. A second important feature is that the openings in the gate lines through which the emitted electrons will pass are made to be significantly narrower than in conventional designs.
REFERENCES:
patent: 5458520 (1995-10-01), DeMercurio et al.
patent: 5461009 (1995-10-01), Huang et al.
patent: 5632664 (1997-05-01), Scoggan et al.
Huang Jammy Chin-Ming
Liu Nanchou David
Lu Jin-Yuh
Ackerman Stephen B.
Alanko Anita
Breneman Bruce
Industrial Technology Research Institute
Saile George O.
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