Superconductor technology: apparatus – material – process – Precursor of high temperature superconductor material or... – Target for coating
Patent
1994-04-13
1995-05-09
King, Roy V.
Superconductor technology: apparatus, material, process
Precursor of high temperature superconductor material or...
Target for coating
505474, 505473, 505729, 505732, 427 62, 427596, 4271263, 117 13, C30B 1500, B05D 3106, B05D 512
Patent
active
054139880
ABSTRACT:
An oxide superconductor thin film of Y.sub.1.+-..alpha. Ba.sub.2.+-..beta. Cu.sub.3.+-..gamma. O.sub.7-.delta. with a smooth surface having a low density of particles being generated without decreasing superconductivity is produced by the steps of applying a pulsed laser beam to the target formed of an oxide material having an apparent density of 95% or more, substantially composed of Y.sub.1.+-..alpha. Ba.sub.2.+-..beta. Cu.sub.3.+-..gamma. O.sub.7-.delta., which is obtained from a molded body of an amorphous powder by subjecting it to partial melting, followed by gradual cooling, depositing and accumulating an irradiated and evaporated oxide material of the target on a substrate.
REFERENCES:
patent: 5077269 (1991-12-01), Sugihara et al.
Ren et al, "Epitaxial Growth of Yttrium Barium Copper Oxide (YBa.sub.2 Cu.sub.3 O.sub.7-8) Superconducting Thin Films by D.C. Magnetic Sputtering Using a Partially Melted Sintered Target," Appl. Phys. A. A54(3)1992, pp. 303-307.
Inoue et al, "Localized Electrons Around Cu Atoms of Superconductor, Tetragonal YBa.sub.2 Cu.sub.3-x O.sub.7-y ", Jpn. J. Appl. Phys. 26(9) Aug. 1987 pp. L1365-L1367.
Enomoto Youichi
Fujino Shuichi
Hayashi Kunihiko
Tanaka Shoji
International Superconductivity Technology Center
King Roy V.
Mitsubishi Materials Corporation
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