Etching a substrate: processes – Forming or treating thermal ink jet article
Patent
1992-10-30
1995-08-22
Powell, William A.
Etching a substrate: processes
Forming or treating thermal ink jet article
216 67, 216 51, B44C 122
Patent
active
054436877
ABSTRACT:
A method for manufacture of an ink jet head comprises the process of forming a head main body by providing a positive resist layer to constitute ink passages for a substrate having ink ejection pressure generating means and then a ceiling member therewith; forming a carbon-contained film for the surface where the ink discharging ports of the head main body are formed; conducting a fluoric plasma treatment given to the carbon-contained film by utilizing a hydrofluoride compound; and removing the positive resist layer. With this method, an F-C coupled water repellent film is formed on the discharging port formation surface of an ink jet recording head evenly with a desirable bonding capability to enhance the reliability of water repellency.
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Kawajiri Yukio
Koyama Shuji
Shibata Makoto
Sueoka Manabu
Suzuki Takumi
Canon Kabushiki Kaisha
Powell William A.
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