Method for manufacturing an electronic device

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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Details

C438S707000, C438S745000, C134S001000, C134S001300

Reexamination Certificate

active

06995092

ABSTRACT:
When an electronic device having an element including an insulating metal oxide film is manufactured, either dry cleaning or a cleaning solution containing substantially no water is used in a cleaning step conducted after a step of forming the insulating metal oxide film.

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patent: 01077027 (1989-03-01), None
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Hitoshi, Manufacture of Electrode Terminal of Active Device, Mar. 23, 1989, English Abstract of JP 01077027 A), 1 page.

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