Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-02-07
2006-02-07
Norton, Nadine G. (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S707000, C438S745000, C134S001000, C134S001300
Reexamination Certificate
active
06995092
ABSTRACT:
When an electronic device having an element including an insulating metal oxide film is manufactured, either dry cleaning or a cleaning solution containing substantially no water is used in a cleaning step conducted after a step of forming the insulating metal oxide film.
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McDermott Will & Emery LLP
Norton Nadine G.
Umez-Eronini Lynette T.
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