Method for manufacturing an electron emitter

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

Reexamination Certificate

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Details

C445S024000, C445S050000, C445S051000, C438S022000, C438S200000, C438S688000, C438S715000, C438S778000

Reexamination Certificate

active

07579051

ABSTRACT:
A method for manufacturing an electron emitter, the method includes discharging a droplet of a function liquid containing a material for forming the conductive film onto a discharge surface of the substrate by a droplet discharge device to adhere a liquid-state object to at least part of an area in which the conductive film is to be formed, drying the liquid-state to form the conductive film, and forming an electron emission section in the conductive film by applying an current between the pair of element electrodes, wherein when accompanied by the drying to form the conductive film, the discharging forms the liquid-state object in a shape having a constricted part for forming a latent image section that has a relatively thin film thickness in a portion for forming the electron emitter.

REFERENCES:
patent: 6017259 (2000-01-01), Motoi et al.
patent: 6734029 (2004-05-01), Furusawa
patent: 769796 (1997-04-01), None
patent: 03-203144 (1991-09-01), None
patent: 09-245625 (1997-09-01), None
patent: 10-003852 (1998-01-01), None
patent: 10-069850 (1998-03-01), None
patent: 2001-307621 (2001-11-01), None
patent: 2003-157760 (2003-05-01), None
patent: 2004-192811 (2004-07-01), None

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