Method for manufacturing an array of thin film actuated mirrors

Optical: systems and elements – Mirror – Including specified control or retention of the shape of a...

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359224, 359291, 359900, 29 2535, 310328, 310366, G02B 2600

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active

055791794

ABSTRACT:
An improved method for manufacturing an array of M.times.N thin film actuated mirrors comprises the steps of: providing a base having a flat top surface; forming sequentially a separation layer, a first thin film layer, and a thin film electrodisplacive layer on the top surface of the base; heat treating the thin film electrodisplacive layer to allow a phase transition to take place; forming sequentially a second thin film layer, a elastic layer, and a thin film sacrificial layer on top of the thin film electrodisplacive layer; forming an array of M.times.N empty slots to the sacrificial layer; forming a supporting layer on top of the sacrificial layer; forming an array of M.times.N conduits, each of the conduits passing through the supporting layer and each of the empty slots to thereby form a multilayer structure; forming an array of M.times.N transistors on top of the multilayer structure to thereby form a semifinished actuated mirror structure; attaching an active matrix to the semifinished actuated mirror structure; separating the base from the semifinished actuated mirror structure by removing the separation layer to thereby form an actuated mirror structure; patterning the actuated mirror structure into an array of M.times.N semifinished actuated mirrors; and removing the thin film sacrificial layer to thereby form the array of M.times.N thin film actuated mirrors.

REFERENCES:
patent: 5159225 (1992-10-01), Um
patent: 5469302 (1995-11-01), Lim
patent: 5505807 (1996-04-01), Min et al.
patent: 5506720 (1996-04-01), Yoon

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