Method for manufacturing a thin film magnetic head

Details Method for manufacturing a thin film magnetic head Method for manufacturing a thin film magnetic head

2006-06-27

2006-06-27

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603180, C029S603140, C360S313000, C205S119000, C216S022000, C216S041000

Reexamination Certificate

active

07065859

ABSTRACT:
A first magnetic film is formed in a primary pattern which is larger than its definitive pattern and of which edges are located within frames to be used in a frame-plating method for the second magnetic film after forming the first pole portion and the gap film. Then, the second magnetic film is formed by the frame-plating method, and the first magnetic film is etched into the definitive pattern through the second magnetic film as a mask.

REFERENCES:
patent: 5200056 (1993-04-01), Cohen et al.
patent: 5606478 (1997-02-01), Chen et al.
patent: 5664316 (1997-09-01), Chen et al.
patent: 6047462 (2000-04-01), Miyauchi et al.
patent: A-5-73839 (1993-03-01), None
patent: 11-71688 (1999-03-01), None
Wells et al., “Magnetic Domains in Thin-Film Recording Heads as Observed in the SEM by a Lock-In Technique”, IEEE Transactions on Magnetics, vol. MAG-17, No. 3, May 1981, pp. 1253-1261.

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