Method for manufacturing a thin film head

Details Method for manufacturing a thin film head Method for manufacturing a thin film head

2006-09-12

2006-09-12

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603070, C029S603140, C029S603270, C360S324000, C360S325000, C360S326000, C360S327000, C360S324120, C427S127000, C427S128000

Reexamination Certificate

active

07103962

ABSTRACT:
A magnetoresistive thin film head comprises a magnetoresistive element including an antiferromagnetic layer, a pinned layer, a nonmagnetic conductive layer and a free magnetic layer, and a pair of the right and the left laminated transverse biasing layers, each including a nonmagnetic layer, a ferromagnetic layer and an antiferromagnetic layer, provided on the free magnetic layer constituting said magnetoresistive element. The layer thickness of said nonmagnetic layer has been established to a certain specific value so that magnetizing direction in said free magnetic layer opposing to the ferromagnetic layer via said nonmagnetic layer assumes a direction that is opposite to that of said ferromagnetic layer.

REFERENCES:
patent: 5708358 (1998-01-01), Ravipati
patent: 5896252 (1999-04-01), Kanai
patent: 6055135 (2000-04-01), Fukamichi et al.
patent: 6201673 (2001-03-01), Rottmayer et al.
patent: 10177706 (1998-06-01), None
“Thin film head characteristics studied by inductance change from bias current control”; Kawakami, K.; Ohtu, T.; Homma, H.; Digests of Intermag '92., International; Apr. 13-16, 1992 pp. 8-8.
“Thin film head characteristics studied by inductance change from bias current control” Kawakami, K.; Ohtu, T.; Homma, H.; Magnetics, IEEE Transactions on vol. 28, Issue 5, Sep. 1992 pp. 2109-2111.

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