Method for manufacturing a semiconductor device utilizing an ano

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Controlling current distribution within bath

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Details

205106, 205107, 205108, 205124, 205229, 205316, 205324, C25D 500, C25D 518, C25D 1100, C25D 548

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055956386

ABSTRACT:
An anodic oxide containing impurities at a low concentration and thereby improved in film quality, and a process for fabricating the same. The process comprises increasing the current between a metallic thin film and a cathode until a voltage therebetween reaches a predetermined value, and maintaining the voltage at the predetermined value thereafter.

REFERENCES:
patent: 2918416 (1959-12-01), Taylor
patent: 3020219 (1962-02-01), Franklin et al.

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