Method for manufacturing a semiconductor device, stencil...

Details Method for manufacturing a semiconductor device, stencil... Method for manufacturing a semiconductor device, stencil...

2007-01-03

2008-12-02

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07459246

ABSTRACT:
Preparing a stencil mask comprising a silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to the semiconductor substrate using the stencil mask which is opposingly arranged on the semiconductor substrate.

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patent: 5523185 (1996-06-01), Goto
patent: 5858576 (1999-01-01), Takashi et al.
patent: 6187481 (2001-02-01), Rolfson
patent: 6210842 (2001-04-01), Kim
patent: 6335534 (2002-01-01), Suguro et al.
patent: 7179569 (2007-02-01), Suguro et al.
patent: 06-244091 (1994-09-01), None

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