Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2011-04-19
2011-04-19
Smith, Matthew S (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S725000, C438S727000, C438S730000, C438S905000
Reexamination Certificate
active
07928014
ABSTRACT:
A method for manufacturing a semiconductor device includes: mounting a wafer having an exposed silicon nitride film, on an electrode received in a plasma chamber; dry-cleaning the chamber to remove reaction products accumulated on the wall and ceiling of the chamber, anisotropic-etching the silicon nitride film and an underlying silicon film for patterning; and removing the wafer from the chamber. The method repeats the treatment for a number of semiconductor wafers.
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Elpida Memory Inc.
Parker John M
Smith Matthew S
Young & Thompson
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