Method for manufacturing a self-aligned type out-rigger phase sh

Details Method for manufacturing a self-aligned type out-rigger phase sh Method for manufacturing a self-aligned type out-rigger phase sh

1996-12-27

1998-12-22

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058517057

ABSTRACT:
A method of manufacturing a self-aligned type out-rigger phase shift mask includes the steps of forming light-shielding patterns spaced apart by a predetermined distance from each other on a transparent substrate. A photosensitive organic layer is formed on the light-shielding patterns and the substrate. The photosensitive organic layer is surface-treated with an organic material to form a hard-soluble layer on a surface of the photosensitive organic layer into which the organic material soaks. Back side exposure and development is performed to form a hard-soluble layer/photosensitive organic material stacked pattern having over-hanging parts on upper side edges of the stacked pattern. The substrate is selectively etched by using the hard-soluble layer/photosensitive organic material stacked pattern as a mask to define a first pattern and a second pattern on a surface of the substrate between the light-shielding patterns. Then, the hard-soluble layer/photosensitive organic material stacked pattern is removed.

REFERENCES:
patent: 4717689 (1988-01-01), Maas et al.
patent: 5136344 (1992-08-01), Pronko
patent: 5217830 (1993-06-01), Lowrey
patent: 5260152 (1993-11-01), Shimizu et al.
patent: 5300379 (1994-04-01), Dao et al.
patent: 5525192 (1996-06-01), Lee et al.

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