X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-07-10
2007-07-10
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S082000, C378S145000, C250S505100
Reexamination Certificate
active
11290545
ABSTRACT:
A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.
REFERENCES:
patent: 5646976 (1997-07-01), Gutman
patent: 5742658 (1998-04-01), Tiffin et al.
patent: 6014423 (2000-01-01), Gutman et al.
patent: 6226349 (2001-05-01), Schuster et al.
patent: 6249566 (2001-06-01), Hayashi et al.
patent: 6278764 (2001-08-01), Barbee et al.
patent: 6285743 (2001-09-01), Kondo et al.
patent: 6317483 (2001-11-01), Chen
patent: 6339634 (2002-01-01), Kandaka et al.
patent: 6389100 (2002-05-01), Verman et al.
patent: 6421417 (2002-07-01), Jiang et al.
patent: 6504902 (2003-01-01), Iwasaki et al.
patent: 6529578 (2003-03-01), Taguchi et al.
patent: 6577704 (2003-06-01), Holz
patent: 6590959 (2003-07-01), Kandaka et al.
patent: 6606371 (2003-08-01), Antonell et al.
patent: 6625251 (2003-09-01), Takenaka et al.
patent: 6823042 (2004-11-01), Hayashi et al.
patent: 6829327 (2004-12-01), Chen
M. Schuster et al., “Laterally Graded Multilayer Optics for X-Ray Analysis”, SPIE 3767, 183-198 (1999).
Dahms Michael
Michaelsen Carsten
Ho Allen C.
Incoatec GmbH
Vincent Paul
LandOfFree
Method for manufacturing a reflector for X-ray radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing a reflector for X-ray radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing a reflector for X-ray radiation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3775609