Method for manufacturing a recessed semiconductor device

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

29571, 29578, 29580, 29576W, 148 15, 148DIG82, 148DIG85, 357 41, 357 49, 357 56, 156649, 156647, H01L 21308, H01L 2978

Patent

active

046428801

ABSTRACT:
A method for manufacturing a semiconductor device comprises a first step of forming a field insulation layer on a p-type semiconductor substrate and a second step of forming an n.sup.+ -type region and n-type region in an element area surrounded by the field insulation layer. In particular, the second step includes a step of forming, in the element area, a recess having an inclined portion and flat bottom portion, a step of forming an SiO.sub.2 film of a uniform thickness on the inclined portion and flat bottom portion, and a step of ion-implanting an n-type impurity into the substrate through the SiO.sub.2 and effecting an annealing process.

REFERENCES:
patent: 3514844 (1970-06-01), Bower et al.
patent: 4453306 (1984-06-01), Lynch et al.
patent: 4455193 (1984-06-01), Jeuch et al.
patent: 4486943 (1984-12-01), Ryden et al.
patent: 4492008 (1985-01-01), Anantha et al.

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