Method for manufacturing a phase shift mask

Details Method for manufacturing a phase shift mask Method for manufacturing a phase shift mask

1994-08-29

1996-03-12

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, G03F 900

Patent

active

054984971

ABSTRACT:
A phase shift layer is formed on a transparent glass on which a Cr pattern is formed and a phase shift layer pattern self-aligned by the Cr pattern is formed so that high resolution is obtained by minimized the overlapping error and the reliability of the semiconductor device is improved.

REFERENCES:
patent: 5130263 (1992-07-01), Possin et al.
patent: 5169737 (1992-12-01), Haws

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