Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2008-09-30
2011-11-29
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S075000, C216S089000, C438S692000, C438S713000
Reexamination Certificate
active
08066892
ABSTRACT:
A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.
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Guthrie Hung-Chin
Hsu Yimin
Jiang Ming
Zhang Sue Siyang
Hitachi Global Storage Technologies - Netherlands B.V.
Vinh Lan
Zilka-Kotab, PC
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