Method for manufacturing a nanostructure at a predetermined...

Coating processes – Electrical product produced

Reexamination Certificate

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C427S523000, C427S551000

Reexamination Certificate

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07390527

ABSTRACT:
A method is for manufacturing a nanostructure in-situ, at least one predetermined point on a supporting carrier. The method includes choosing a suitable material for a substrate in the carrier, creating the substrate, and preparing a template on the substrate so that the template covers the predetermined point. The template is given a proper shape according to the desired final shape of the nanostructure, and a film of nanosource material with desired dimensions is formed on the template. The film of nanosource material is made to restructure from a part of the template, thus forming the desired nanostructure. Suitably, the template includes a first and a second area which have different properties with respect to the nanosource material.

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David S.Y. Hsu. et al., “Gated In-Situ Grown Carbon Nanotube Field Emitter Arrays,” Vacuum Microelectronics Conf. 2001, IV Proceedings of the 14thInternational, Davis, CA 2001, pp. 51-52.

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