Method for manufacturing a nanoporous framework and a...

Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C423S702000

Reexamination Certificate

active

08075867

ABSTRACT:
The invention concerns a method for manufacturing nanoporous metal oxide or metal active sites frameworks in which the metal oxide precursor is distributed into the framework in the form of a metal soap surfactant.The invention also covers a nanostructure framework comprising metal oxide active sites which are evenly distributed in the framework.

REFERENCES:
patent: 4234437 (1980-11-01), Friberg et al.
R. W. Corkery. Artificial biomineralisation and metallic soaps, Dissertation Mar. 1998, Australian NationalUniversity.
S. Che, A. E. Garcia-Bennett, T. Yokoi, K. Sakamoto, H. Kunieda, O. Terasaki, T. Tatsumi. A novel anionic surfactant templating route for synthesizing mesoporous silica with unique structure, Nature Materials 2003, 2, 801-805.
A. E. Garcia-Bennett, k. Miyasaka, O. Terasaki. Structural Solution of Mesocaged Material AMS-8, Chem. Mater. 2004, 16, 3597-3605.
“Transition metal oxide-doped mesostructured silica films” Huesing et al.,Applied Catalysis A: General, vol. 254, No. 2, Nov. 20, 2003, pp. 297-310.
“Supramolecular templated synthesis of platinum-supported silica” Romero et al.,Chem. Commun., 1999, pp. 873-874.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing a nanoporous framework and a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing a nanoporous framework and a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing a nanoporous framework and a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4297753

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.