Method for manufacturing a moisture permeable electrode in a moi

Details Method for manufacturing a moisture permeable electrode in a moi Method for manufacturing a moisture permeable electrode in a moi

1989-07-17

1992-02-11

Bueker, Richard

Coating processes

Electrical product produced

Condenser or capacitor

427124, 427250, 361286, H01G 520

Patent

active

050874802

ABSTRACT:
A moisture sensing element includes a moisture permeable gold electrode film formed on a moisture sensitive polyvinyl alcohol film which is carried by a glass substrate. The moisture permeable gold electrode film is formed by a vacuum evaporation under a nitrogen gas pressure of 1.0.times.10.sup.-3 Torr through 1.0.times.10.sup.-2 Torr. The deposition rate is about 0.5 .ANG./sec., and the moisture permeable gold electrode film has a thickness of 100 .ANG. through 200 .ANG..

REFERENCES:
patent: 4437227 (1984-03-01), Flannery
patent: 4438480 (1984-03-01), Chambaz
patent: 4486464 (1984-12-01), Young
patent: 4496648 (1985-01-01), Young
Powell et al, Vapor Deposition, John Wiley and Sons, N.Y., .COPYRGT.1966, pp. 233-234.

Affiliated with

Also associated with

Rating

Method for manufacturing a moisture permeable electrode in a moi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing a moisture permeable electrode in a moi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing a moisture permeable electrode in a moi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-780961