Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2008-03-06
2011-10-04
Kim, Paul D (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603110, C029S603130, C029S603140, C029S603150, C029S603180, C216S062000, C216S066000, C216S067000, C360S121000, C360S122000, C360S317000, C427S127000, C427S128000, C451S005000, C451S041000
Reexamination Certificate
active
08028400
ABSTRACT:
A method for forming a tapered, electroplated structure. The method involves forming a first mask structure having an opening. A shrink material is deposited into the opening, such that the thickness of the shrink material is less than the thickness of the first mask structure. The first mask structure and the shrink material are then heated causing the sides of the opening in the mask structure to bulge inward. The shrink material is then removed, and a first electrically conductive material can then be electroplated into the opening to a thickness that is much less than the thickness of the mask. The bulbous shaped of the deformed photoresist mask forms a taper on the first electrically conductive material. The first mask can then be removed and a second electrically conductive material can be electroplated over the first electrically conductive material.
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Bonhôte Christian René
Lille Jeffrey S.
MacDonald Scott Arthur
Hitachi Global Storage Technologies - Netherlands B.V.
Kim Paul D
Zilka-Kotab, PC
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