Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-06-19
2008-10-21
Kebede, Brook (Department: 2823)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S015000, C438S158000, C257SE29151
Reexamination Certificate
active
07439090
ABSTRACT:
A method for manufacturing a lower substrate of a liquid crystal display device is disclosed and more particularly, a method for manufacturing a color filter layer on a lower substrate is disclosed. This method is achieved by using a photosensitive insulating layer as a passivation layer or an overcoat of a thin film transistor to reduce the number of masks, or of photographic steps. The photosensitive insulating layer used in the method has the characteristics of both photoresist and passivation layers so as to protect a thin film transistor from moisture and oxygen. In addition, the number of masks, or of photographic steps used in this method can be further reduced by ink-jet printing a color filter layer or by half-tone mask technique.
REFERENCES:
patent: 6057896 (2000-05-01), Rho et al.
patent: 2003/0013236 (2003-01-01), Nakata et al.
Ting Chin-Kuo
Tung Yi-Pin
AU Optronics Corp.
Bacon & Thomas PLLC
Kebede Brook
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