Method for manufacturing a head for recording and reading...

Details Method for manufacturing a head for recording and reading... Method for manufacturing a head for recording and reading...

2005-05-03

2005-05-03

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S852000, C029SDIG001, C438S700000, C438S701000, C438S756000

Reexamination Certificate

active

06886238

ABSTRACT:
A method of manufacturing a head for recording and reading optical data. The method includes: providing a silicon substrate on which a silicon oxide film and a silicon deposition layer are stacked; etching the bottom of the silicon substrate by a given depth to form an opening; forming an aperture having a given slant angle in the silicon deposition layer located on the opening; etching the portion of the silicon oxide film, exposed through the opening; forming a dielectric layer on the silicon deposition layer including the aperture; removing an exposed portion of the bottom of the silicon deposition layer by a given thickness to expose a portion of the dielectric layer, forming a probe on the exposed portion of the dielectric layer and the silicon deposition layer exposed through the opening; and burying the aperture with a non-linear material.

REFERENCES:
patent: 5843844 (1998-12-01), Miyanaga
patent: 6215114 (2001-04-01), Yagi et al.
patent: 3-139823 (1991-06-01), None
patent: 2000-046141 (2000-07-01), None
Direct Observation of Selffocusing with subdiffraction limited resolution using near field scanning optical microscope; K. Song
High Throughput aperture near-field scanning optical microscopy; P. Minh.
Increased throughput of a near-field optical fiber probe over 1000 times by the use of a triple tapered structure; T. Yatsui.
High efficient excitation of optical near field on an apertured fiber probe with an asymmetric structure; T. Yatsui.

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