Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1989-05-17
1991-02-19
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430323, 430324, 2505051, 2504923, G03F 116
Patent
active
049943367
ABSTRACT:
A method for manufacturing a control plate for a lithographic device. The control plate manufactured with a method of the present invention is essentially composed of a semiconductor substrate having an opening for the passage of particle probes emanating from a multi-beam source and of a corresponding plurality of deflection elements that are connected via bond pads and connecting lines to the electronics of the lithographic device that generates control signals. Lithographic methods and voltaic shaping techniques are utilized for the manufacture of the deflection elements located on the semiconductor substrate which is coated with a dielectric.
REFERENCES:
patent: 4393127 (1983-07-01), Greschner et al.
patent: 4417946 (1983-11-01), Bohlen et al.
patent: 4448865 (1984-05-01), Bohlen et al.
patent: 4724328 (1988-02-01), Lischke
patent: 4780382 (1988-10-01), Stengl et al.
Behringer et al., "Shadow Projection Mask and Method of Producing Same", IBM Tech. Disc. Bull., vol. 27 (6), Nov. 1984.
Benecke Wolfgang
Lischke Burkhard
Schnakenberg Uwe
Dees Jos,e G.
Siemens Aktiengesellschaft
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