Method for manufacturing a chemically adsorbed film and a chemic

Details Method for manufacturing a chemically adsorbed film and a chemic Method for manufacturing a chemically adsorbed film and a chemic

1996-06-11

1998-12-15

Cameron, Erma

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427535, 427387, 4273881, 427389, 4273897, 4273899, 4273935, 427391, B05D 306

Patent

active

058493697

ABSTRACT:
The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.

REFERENCES:
patent: 4746366 (1988-05-01), Philipp et al.
patent: 5338579 (1994-08-01), Ogawa et al.
patent: 5372851 (1994-12-01), Ogawa et al.
patent: 5435839 (1995-07-01), Ogawa
patent: 5468551 (1995-11-01), Ogawa

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