Method for manufacturing a BiCMOS semiconductor device

Fishing – trapping – and vermin destroying

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437 34, 437 58, 437162, 148DIG144, H01L 21331, H01L 21336, H01L 21225

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051186330

ABSTRACT:
Sources and drains of MOS transistors are formed after the formation of an emitter of a bipolar transistor, whereby the sources and drains are made smaller in thickness than the emitter. Since the sources and drains are not subjected to a high-temperature heat treatment conducted in the formation of the emitter, there is no fear of increase in thickness of the sources and drains caused by the diffusion of impurities. There can be formed a BiCMOS having a high integration density and superior characteristics.

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