Method for manufacture of insulating film and interface between

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 82, H01C 21316

Patent

active

045670617

ABSTRACT:
An insulation film of improved properties and an interface of similarly improved properties between the insulation film and a semiconductor are produced by heating silicon, a silicon compound or a silicon dioxide film in an atmosphere formed by incorporating a carbon fluorine gas into an oxidative gas.

REFERENCES:
patent: 3692571 (1972-09-01), Colton et al.
patent: 3698948 (1972-10-01), Barone et al.
patent: 4007294 (1977-02-01), Woods et al.
patent: 4223048 (1980-09-01), Engle
patent: 4232057 (1980-11-01), Ray
patent: 4246296 (1981-01-01), Chang

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