Method for making thin film filter having a negative...

Details Method for making thin film filter having a negative... Method for making thin film filter having a negative...

2006-05-30

2006-05-30

Stein, Stephen (Department: 1775)

Coating processes

Optical element produced

C427S164000, C427S165000, C427S289000, C427S299000, C427S398100

Reexamination Certificate

active

07052733

ABSTRACT:
A method for making thin film filters having a negative temperature drift coefficient are the subject of the present invention. Such filters can achieve better optical control within an operational temperature range from −5° C. to 70° C. degrees. A first embodiment of the present invention includes: 1. providing a substrate wafer which has a coefficient of thermal expansion (CTE) greater than that of a selected film stack material; 2. polishing the substrate wafer; 3. depositing thin film layers made of the film stack material on the substrate wafer at a temperature substantially higher than room temperature; 4. cooling the substrate-film stack laminate to room temperature, thus forming a convex-shaped laminate; 5. cutting the cooled laminate into pieces. A second embodiment includes the steps of: 1. providing a laminate composed of a glass substrate and a film stack; 2. using at least one ion beam source to bombard the film stack of the laminate with high energy ions; 3. cutting the bombarded laminate into pieces.

REFERENCES:
patent: 4741962 (1988-05-01), Wada et al.
patent: 4793908 (1988-12-01), Scott et al.
patent: 6798553 (2004-09-01), Scobey et al.
patent: 2003/0123167 (2003-07-01), Kolberg et al.

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