Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1987-06-26
1991-08-20
Beck, Shrive
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
505734, 505736, 505742, 427 62, 427 63, 427226, 427229, 427377, B05D 512, B05D 302, B05D 304
Patent
active
050414208
ABSTRACT:
A process is disclosed for producing superconductor films on a variety of substrates, and more particularly a patterned superconductor film on a planar substrate. The basic process includes the steps of: 1) depositing a metal film of superconductor precursor elements on a substrate; 2) patterning the metal film; and 3) oxidizing the metal film to form a superconductor film. Because the process separates the metal precursor film formation, patterning, and oxidation steps, each of the steps can be individually optimized.
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Anderson John T.
Nagesh V. K.
Beck Shrive
Bueker Margaret
Hewlett--Packard Company
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