Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2006-06-06
2006-06-06
Nguyen, Ha Tran (Department: 2812)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
C427S079000
Reexamination Certificate
active
07056357
ABSTRACT:
A method for making a solid electrolytic capacitor including a flat porous body is provided. This method utilizes a mold which includes a horizontal surface and four vertical side surfaces. The horizontal surface and the side surfaces define a cavity into which powder made of valve metal is loaded. By compacting the powder in the cavity, a flat porous body having a predetermined thickness is formed. In the compacting, the powder is compressed vertically with the four side surfaces fixed in position.
REFERENCES:
patent: 4975412 (1990-12-01), Okazaki et al.
patent: 6139593 (2000-10-01), Kono
patent: 6836401 (2004-12-01), Yoshida et al.
patent: 2005/0122663 (2005-06-01), Poltorak
patent: 2003-77769 (2003-03-01), None
Hamre Schumann Mueller & Larson P.C.
Nguyen Ha Tran
Rohm Co. Ltd
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