Method for making Schottky barrier diodes with engineered height

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148 15, 427 84, 427 88, H01L 2126

Patent

active

044215770

ABSTRACT:
Schottky barrier diodes with engineered barrier heights in III-V semiconductor material are disclosed. By fabricating the diodes using a very clean and defect free surface, the barrier height can be controlled by introducing selected amounts of dopant in the surface prior to evaporation of a contact metal. By selecting a dopant having the same conductivity as the semiconductor material a reliable ohmic contact can be provided.

REFERENCES:
patent: 4045248 (1977-08-01), Shannon
patent: 4211587 (1980-07-01), Massies

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for making Schottky barrier diodes with engineered height does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making Schottky barrier diodes with engineered height, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making Schottky barrier diodes with engineered height will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-106196

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.