Method for making polymers with intrinsic light-absorbing proper

Details Method for making polymers with intrinsic light-absorbing proper Method for making polymers with intrinsic light-absorbing proper

1993-04-30

1996-11-26

Michl, Paul R.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

4274071, 427258, 4273722, 4273855, 427386, 524612, 524220, 524221, 524233, 524241, 524261, 524284, 4302711, C08J 300, C08K 536, C08L 8100

Patent

active

055786766

ABSTRACT:
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.

REFERENCES:
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4950583 (1990-08-01), Brewer et al.
patent: 5057399 (1991-10-01), Flaim et al.
patent: 5110697 (1992-05-01), Lamb, III et al.

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