Method for making photoresists

Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image

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430260, G03c 500

Patent

active

041937970

ABSTRACT:
A process for forming a photoresist which comprises:

REFERENCES:
patent: 3046120 (1962-07-01), Schmidt et al.
patent: 3126281 (1964-03-01), Sus et al.
patent: 3395016 (1968-07-01), Loeb
patent: 3493371 (1970-02-01), Poot
patent: 3526504 (1970-09-01), Celeste
patent: 3592646 (1971-07-01), Holstead et al.

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