Method for making nitride cantilevers devices

Details Method for making nitride cantilevers devices Method for making nitride cantilevers devices

1998-09-14

2000-12-05

Gulakowski, Randy

Etching a substrate: processes

Forming or treating an article whose final configuration has...

216 2, B44C 122, C25F 300

Patent

active

061562165

ABSTRACT:
A method for making a silicon stylus protruding through a nitride layer is used to fabricate nitride micro-apertures, silicon styluses supported by nitride cantilever arms and charge sensitive silicon styluses supported by nitride cantilever arms. The method uses an anisotropic dry etch to define the apertures of the nitride micro-apertures and the apexes of the silicon styluses. Nitride apertures made by this method are useful for supporting micro-electronics and micro-optical devices. Surface probing devices with silicon styluses supported by nitride cantilever arms have applications in AFM and STM and are particularly useful in applications that require an electrical connection between the silicon stylus and external circuitry through the cantilever arm.

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