Gas separation: processes – Selective diffusion of gases – Selective diffusion of gases through substantially solid...
Reexamination Certificate
2006-05-19
2009-12-01
Greene, Jason M (Department: 1797)
Gas separation: processes
Selective diffusion of gases
Selective diffusion of gases through substantially solid...
C095S090000, C095S116000, C095S273000, C095S285000, C095S903000, C096S004000, C096S011000, C055S487000, C055S522000, C055S524000, C055SDIG007, C210S500100, C210S500210, C210S501000, C210S502100, C210S506000, C264S628000, C264S109000, C264SDIG048
Reexamination Certificate
active
07625426
ABSTRACT:
A nano-scale filter (10) includes a porous supporting component (14) and a carbon nanotube filtration membrane (12) sintered on a top surface of the porous supporting component. The porous supporting component has a number of micro-scale pores. The filtration membrane is configured as a network formed by aggregating a number of multi-junction carbon nanotubes. The multi-function carbon nanotubes are selected from the group consisting of two-dimensional junction carbon nanotubes (30, 40, 50, 60), three-dimensional junction carbon nanotubes (20) and an admixture thereof. A method for making the nano-scale filter is also provided.
REFERENCES:
patent: 6495258 (2002-12-01), Chen et al.
patent: 7014681 (2006-03-01), Noack et al.
patent: 7211320 (2007-05-01), Cooper et
patent: 7323033 (2008-01-01), Kroupenkine et al.
patent: 7396798 (2008-07-01), Ma et al.
patent: 7419601 (2008-09-01), Cooper et al.
patent: 2008/0093577 (2008-04-01), Khraishi et al.
patent: 2004-18328 (2004-01-01), None
Chi Clifford O.
Greene Jason M
Hon Hai Precision Industry Co. Ltd.
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