Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-03-31
1998-06-02
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430323, G03F 900
Patent
active
057597243
ABSTRACT:
A method for making a phase shifting mask includes forming an opaque layer on a transparent substrate, and then etching phase shifters and phase transition areas in the substrate using a staged etch process. During the staged etch process, resist masks can be used to etch exposed areas of the substrate to selected intermediate depths to form the phase transition areas, and then to a final depth to form phase shifters. Following each etch stage, a corresponding etch mask can be desensitized rather than being stripped, to provide a multi-layered structure for protecting the opaque layer and substrate during subsequent etch steps. Preferably, the desensitized etch masks can be cleaned during the staged etch process to remove particulates using a non aggressive cleaning agent, such as DI water, and then stripped at the same time at the end of the process. In an alternate embodiment, the phase shifters rather than being etched into the substrate, can be formed in a deposited layer, such as a layer of spin-on-glass.
REFERENCES:
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5288568 (1994-02-01), Cathey, Jr.
patent: 5308722 (1994-05-01), Nistler
patent: 5376483 (1994-12-01), Rolfson
patent: 5487962 (1996-01-01), Rolfson
Gratton Stephen A.
Micro)n Technology, Inc.
Rosasco S.
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