Method for making metal oxide sputtering targets (barrier powder

Plastic and nonmetallic article shaping or treating: processes – Forming articles by uniting randomly associated particles – Stratified or layered articles

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

264109, 264332, 264338, 264DIG36, B22F 315, C04B 35453

Patent

active

056562160

ABSTRACT:
An apparatus and process for making metal oxide sputtering targets from volatile and thermally unstable metal oxide powder by enveloping the metal oxide powder in at least one layer of a barrier material while the powder is hot-pressed using a graphite die assembly.

REFERENCES:
patent: 716343 (1902-12-01), Locke
patent: 2886849 (1959-05-01), Brierley
patent: 3892835 (1975-07-01), Holdsworth
patent: 4049523 (1977-09-01), Boehnke et al.
patent: 4094672 (1978-06-01), Fleck et al.
patent: 4382053 (1983-05-01), Rigby
patent: 4647548 (1987-03-01), Klein
patent: 5094787 (1992-03-01), Nakajima et al.
patent: 5145811 (1992-09-01), Lintz et al.
patent: 5160675 (1992-11-01), Iwamoto et al.
patent: 5382405 (1995-01-01), Lowrance, II et al.
B. L. Gehman et al., "Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior", Thin Solid Films, 220 (1992), 333-336.
"Electroceramics Materials .cndot. properties .cndot. applications", A.J. Moulson et al., pp. 353-355, 1990.
"Vapor-phase processing converts refractory metals into ceramics", G.W. Billings, Tech Spotlight, pp. 45 & 46, Advanced Materials & Processes, Apr. 1993.
"Kinetics Studies on the Oxidation of Carbon Monoxide over Pure, Reduced, and Doped Indium Sesquioxides", Sung Han Lee et al. Int'l. J. of Chem. Kinetics, vol. 19, 1-2 (1987).
Brochure: "NX-100.TM. Series of Titanium Carbide Coated Graphite", Lanxide Corp. (undated).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for making metal oxide sputtering targets (barrier powder does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making metal oxide sputtering targets (barrier powder, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making metal oxide sputtering targets (barrier powder will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-157783

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.