Method for making hybrid dielectric film

Details Method for making hybrid dielectric film Method for making hybrid dielectric film

2008-09-16

2008-09-16

Chen, Bret (Department: 1792)

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

C427S097200, C427S097400, C427S255600, C438S763000, C438S778000, C438S780000

Reexamination Certificate

active

10936156

ABSTRACT:
A method of forming a hybrid inorganic/organic dielectric layer on a substrate for use in an integrated circuit is provided, wherein the method includes forming a first dielectric layer on the substrate via chemical vapor deposition, and forming a second dielectric layer on the first dielectric layer via chemical vapor deposition, wherein one of the first dielectric layer and the second dielectric layer is formed from an organic dielectric material, and wherein the other of the first dielectric layer and the second dielectric layer is formed from an inorganic dielectric material.

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Han, K., et al., “Stable and robust low-voltage pentacene transistor based on a hybrid dielectric”. Microelectronic Engineering, vol. 84, Issues 9-10, Sep./Oct. 2007, pp. 2173-2176.

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