Semiconductor device manufacturing: process – Forming schottky junction – Combined with formation of ohmic contact to semiconductor...
Patent
1994-10-21
1997-04-22
Niebling, John
Semiconductor device manufacturing: process
Forming schottky junction
Combined with formation of ohmic contact to semiconductor...
257473, 438572, 438573, 438167, H01L 21265
Patent
active
056228775
ABSTRACT:
A power GaAs Schottky diode with a chemically deposited Ni barrier having a reverse breakdown voltage of 140 V, a forward voltage drop at 50 A/cm.sup.2 of 0.7 V at 23.degree. C., 0.5 V at 150.degree. C. and 0.3 V at 250.degree. C. and having a reverse leakage current density at -50 V of 0.1 .mu.A/cm.sup.2 at 23.degree. C. and 1 mA/cm.sup.2 at 150.degree. C. The high-voltage high-speed power Schottky semiconductor device is made by chemically depositing a nickel barrier electrode on a semiconductor which includes gallium arsenide and then etching the device to create side portions which are treated and protected to create the Schottky device.
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Ashkinazi German
Meyler Boris
Nathan Menachem
Zolotarevski Leonid
Zolotarevski Olga
Friedman Mark M.
Niebling John
Pham Long
Ramot University Authority for Applied Research & Industrial Dev
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