Method for making etch-resistant stencil with dichromate-sensiti

Details Method for making etch-resistant stencil with dichromate-sensiti Method for making etch-resistant stencil with dichromate-sensiti

1976-02-19

1980-10-28

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

156634, 156644, 1566591, 430 23, 430270, 430274, 430320, 430323, G03C 500

Patent

active

042307813

ABSTRACT:
Method comprises applying to a surface to be etched a coating of a liquid composition having a pH of about 5.8 to 7.0 and comprising an alkali caseinate, an alkali dichromate photosensitizer, sodium borate and water. The layer is dried, photoexposed, developed and baked to produce an etch-resistant stencil.

REFERENCES:
patent: 2387056 (1945-10-01), Buck et al.
patent: 2624672 (1953-01-01), Frost et al.
patent: 2677611 (1954-05-01), Gregory et al.
patent: 2716061 (1955-08-01), Lupo
patent: 3745011 (1973-07-01), Hudgin
patent: 3751250 (1973-08-01), Moscony et al.
"The Merck Index of Chemicals and Drugs", 1952, p. 207.

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