Method for making electrochromic films having improved etch resi

Details Method for making electrochromic films having improved etch resi Method for making electrochromic films having improved etch resi

1978-10-23

1980-11-11

Smith, John D.

Coating processes

Electrical product produced

Transparent base

29570, 204192P, 350357, 427109, 4271262, 4271263, 427164, 427165, 427166, 4273722, 427377, G02F 101

Patent

active

042333393

ABSTRACT:
Thin, amorphous electrochromic layers deposited on substrate electrodes by, for example, vacuum deposition techniques, are subjected to a special heat treatment at a selected high temperature for a selected short time to convert at least a free portion of each layer to be exposed to the electrolyte from the amorphous form to a crystalline form while preventing excessive water loss which might adversely affect the electrochromic properties of the layer for display purposes. Crystallization of at least the free surface portion of the electrochromic layer significantly increases its etch resistance whereas retention of water in the electrochromic layer maintains satisfactory electrochromic properties for display purposes.

REFERENCES:
patent: 4006966 (1977-02-01), Meyers et al.
patent: 4021100 (1977-05-01), Giglia
patent: 4059341 (1977-11-01), Zeller
patent: 4068928 (1978-01-01), Meyers
patent: 4120568 (1978-10-01), Deb et al.
patent: 4123841 (1978-11-01), Yano et al.
Green, M. and Richman D., "A Solid State Electrochromic Cell-the RbAg.sub.4 I.sub.5 /WO.sub.3 System" Thin Solid Films 24 (1974), S45, 46.
"Proceedings of the Fourth Brown Boveri Synposium on Nonemissive Electrooptic Displays", 1975, pp. 175 to 177.
Green, M and K. S. Kang "Solid State Electrochromic Cells-the M-B-Alumina/WO.sub.3 System" Thin Solid Films, 40 (1977), L19-L21.

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