Method for making an optical waveguide component using a low-str

Details Method for making an optical waveguide component using a low-str Method for making an optical waveguide component using a low-str

1998-05-26

2000-08-15

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427534, 427567, 4271632, 216 24, 216 26, 216 67, 20419226, B05D 506, C23C 1458, C23C 1422, C23C 1414, C23F 100

Patent

active

061033189

ABSTRACT:
A method of forming a layer of silicon on a surface comprises the steps of depositing silicon on the surface by a physical deposition process such as electron beam evaporation and, during said deposition process, subjecting the forming film to ionic bombardment. The resultant silicon film has stresses which are considerably reduced compared to a film produced by an ordinary physical deposition process. This method is particularly well adapted to the formation of relatively thick silicon layers (.gtoreq.1 .mu.m) on a layer (or stack of layers) of silica, to serve as an etching mask in a subsequent deep etching of the silica by reactive ion etching.

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