Method for making an optical micromirror and micromirror or...

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

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C216S002000, C216S026000, C359S291000

Reexamination Certificate

active

07022249

ABSTRACT:
A method for manufacturing an optical micro-mirror including a fixed part and a moveable part, with a reflection device connected to the fixed part by an articulation mechanism. This method realizes a stack including a mechanical substrate, a first layer of thermal oxidation material, and at least one second layer of material for forming the moveable part, realizes the articulation mechanism, realizes the reflection device on the second layer, realizes the moveable part by etching of at least the second layer of material, and eliminates the thermal oxidation layer to liberate the moveable part. Such an optical micro-mirror may find possible applications to optical routing or image projection systems.

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K.E. Petersen: “Silicon torsional scanning mirror” IBM Journal of Research and Development, vol. 24, No. 5, pp. 631-637 Sep. 1, 1980.

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