Method for making a tantala/silica interference using heat treat

Details Method for making a tantala/silica interference using heat treat Method for making a tantala/silica interference using heat treat

1997-01-09

1998-12-01

Beck, Shrive

Coating processes

Electrical product produced

Hollow article

427166, 427167, 427255, 4272553, 4272557, 4273762, B05D 512, B05D 302, C23C 1606

Patent

active

058435182

ABSTRACT:
A method for making a tantala/silica interference filter on a vitreous substrate, which filter retains integrity at temperatures in excess of 600.degree. C., includes the steps of depositing by low pressure chemical vapor deposition a first coating of tantala/silica on the substrate, heat treating the first coating, and depositing by low pressure chemical vapor deposition a second coating of tantala/silica, the first and second coatings in combination providing a tantala/silica interference filter with a thickness of at least 3.5 microns on the vitreous substrate. There is further presented an electric lamp having an envelope and an interference filter applied thereto, in accordance with the above method.

REFERENCES:
patent: 4949005 (1990-08-01), Parham et al.
patent: 5138219 (1992-08-01), Krisl et al.
patent: 5412274 (1995-05-01), Parham
patent: 5422534 (1995-06-01), Dynys et al.
patent: 5541470 (1996-07-01), Bandyopadhyay et al.
patent: 5552671 (1996-09-01), Parham et al.
patent: 5569970 (1996-10-01), Dynys et al.
patent: 5648115 (1997-07-01), Bandyopadhyay et al.
patent: 5658612 (1997-08-01), Li et al.

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