Method for making a silicon substrate comprising a buried...

Details Method for making a silicon substrate comprising a buried... Method for making a silicon substrate comprising a buried...

2000-06-08

2010-10-19

Garber, Charles D. (Department: 2812)

Semiconductor device manufacturing: process

Bonding of plural semiconductor substrates

C438S457000, C438S458000, C438S464000

Reissue Patent

active

RE041841

ABSTRACT:
A method for making a silicon substrate having a buried thin silicon oxide film is described. The method consists of: a) producing a first element having a first silicon body whereof the main surface is coated, in succession, with a buffer layer of germanium, or of an alloy of germanium and silicon, and with a thin silicon film; b) producing a second element, having a silicon body whereof a main surface is coated with a thin silicon oxide film; c) linking the first element with the second element such that the thin silicon film of the first element is in contact with the thin silicon oxide film of the second element; and d) eliminating the buffer layer to recuperate the silicon substrate having a buried thin silicon oxide film and a reusable silicon substrate. The method may be useful in making microelectronic devices such as CMOS and MOSFET devices.

REFERENCES:
patent: 5218213 (1993-06-01), Gaul et al.
patent: 5476813 (1995-12-01), Naruse
patent: 5906708 (1999-05-01), Robinson et al.
patent: 6100166 (2000-08-01), Sakaguchi et al.
patent: 6143628 (2000-11-01), Sato et al.
patent: 6294478 (2001-09-01), Sakaguchi et al.
patent: 6534382 (2003-03-01), Sakaguchi et al.
patent: 0 371 862 (1990-06-01), None
patent: 0 779 649 (1997-06-01), None
patent: 96 15550 (1996-05-01), None
French Search Report, French Application No. 9907496; Prepared Feb. 29, 2000.

Affiliated with

Also associated with

Rating

Method for making a silicon substrate comprising a buried... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making a silicon substrate comprising a buried..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making a silicon substrate comprising a buried... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4182673