Etching a substrate: processes – Forming or treating mask used for its nonetching function
Reexamination Certificate
2008-07-01
2008-07-01
Tran, Binh X (Department: 1792)
Etching a substrate: processes
Forming or treating mask used for its nonetching function
C216S017000, C216S052000, C216S075000
Reexamination Certificate
active
07393457
ABSTRACT:
The present invention is to provide a method for making a shadow mask for an opposed discharge plasma display panel by etching one lateral surface of a metal slab to produce a plurality of parallel and equidistant barrier ribs along the vertical and horizontal directions on the lateral surface and a discharging cell by enclosing every four adjacent barrier ribs. A shadow hole is formed at the middle of each discharging cell and etched through the metal slab, and at least one groove interconnected to the shadow holes is produced on another lateral surface of the metal slab by utilizing a rolling process or a stamping process. The adjacent grooves are interconnected with each other, and a plurality of air guide channels is formed on another lateral side, such that a shadow mask can be made in a simple and fast manner, chemical pollutions caused by a traditional double-sided etching can be minimized, and the product yield rate and the manufacturing cost can be effectively improved and lowered.
REFERENCES:
patent: 2005/0093202 (2005-05-01), Yokoyama et al.
patent: 2005/0191783 (2005-09-01), Toyoda et al.
patent: 2005/0231098 (2005-10-01), Chen et al.
patent: 2006/0049756 (2006-03-01), Kim
patent: 2006/0121815 (2006-06-01), Kim et al.
patent: 2006/0225463 (2006-10-01), Sugimoto et al.
Hsu Sheng-Wen
Kao Hsu-Chia
Kao Hsu-Pin
Liang Jang-Jeng
Bacon & Thomas P.L.L.C.
Marketech International Corporation
Tran Binh X
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