Method for making a reticle mask

Details Method for making a reticle mask Method for making a reticle mask

1988-04-28

1989-07-18

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430394, 355 53, 355 54, G03F 100, G03F 900

Patent

active

048493139

ABSTRACT:
An apparatus and a method for making a reticle mask is disclosed. A reticle mask is made by the double pass method wherein scribe lines are first drawn on the reticle mask. Thereafter, a product die pattern is made in the reticle mask by a plurality of times. A plurality of alignment marks are associated with each product die pattern. The plurality of alignment marks are all written in the scribe line region. Thus, any deviation of the relative position of the product die pattern to the scribe line may be quantified.

REFERENCES:
patent: 4505580 (1985-03-01), Michel
patent: 4610940 (1986-09-01), Araihara
patent: 4708466 (1987-11-01), Isehata et al.

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