Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-04-12
2011-04-12
Jelsma, Jonathan (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07923177
ABSTRACT:
The invention relates to a process for fabricating an extreme ultraviolet photolithography mask operating in reflection, comprising a substrate, a mirror structure (uniformly deposited on the substrate, and an absorbent element forming a pattern deposited on the mirror structure, characterized in that the absorbent element is obtained by the irradiation and then development of an organometallic resist layer deposited on the mirror structure.
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Davidson, M. R. et al. “Novel Route for the Production of X-ray Masks from a Range of Organometallic Films.” Microelectronic Engineering Elsevier Publishers BV., Amsterdam, NL, vol. 41-42, Mar. 1998, pp. 277-282, XP004111680, ISSN: 0167-9317.
Bing, Lu et al. “EUV Radiation Damage Test on EUVL Mask Absorber Materials.” Proceedings of the SPIE-The International Society for Optical Engineering SPIE-INT. Soc. Opt. Eng USA, vol. 5256, No. 1, 2003, pp. 1232-1238, XP002397457, ISSN: 0277-786X.
Commissariat a l''Energie Atomique
Jelsma Jonathan
Lowe Hauptman & Ham & Berner, LLP
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