Method for making a part with clearance volume by rotational...

Plastic and nonmetallic article shaping or treating: processes – Mechanical shaping or molding to form or reform shaped article – Shaping against forming surface

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C264S310000, C264S255000, C156S074000

Reexamination Certificate

active

10344558

ABSTRACT:
A cylindrical element is manufactured by a process which includes depositing successive layers of thermoplastic materials in a cycle by rotation moulding, or by a technique enabling a deposit of successive layers, the cycle including at least one deposit by rotation moulding or by a technique enabling deposit of successive layers at a temperature from 170 to 240° C. The cylindrical element contains at least one layer containing an ethylene-vinyl alcohol copolymer with a density at the above temperature of between 0.94 and 1.4, and a melt flow index of between 1.3 and 4.2 g/10 minutes.

REFERENCES:
patent: 4451512 (1984-05-01), Yazaki et al.
patent: 4535901 (1985-08-01), Okudaira et al.
patent: 4810542 (1989-03-01), Kawai et al.
patent: 5171346 (1992-12-01), Hallett
patent: 5320889 (1994-06-01), Bettle, III
patent: 5567296 (1996-10-01), Luch
patent: 6068933 (2000-05-01), Shepard et al.
patent: 0 518 354 (1992-12-01), None
patent: 1 604 824 (1972-04-01), None
patent: 2 776 228 (1999-09-01), None
patent: 403002009 (1991-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for making a part with clearance volume by rotational... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making a part with clearance volume by rotational..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making a part with clearance volume by rotational... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3760870

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.