Method for making a nonvolatile memory device utilizing a field

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437179, 437904, 437 52, 148DIG139, 148DIG140, H01L 218239

Patent

active

055630812

ABSTRACT:
A method for making a nonvolatile memory device having a field effect transistor for storing information, and a Schottky diode in series with the field effect transistor. The field effect transistor includes source and drain regions in a semiconductor substrate, with a channel region interposed between them and a gate electrode above the channel region. A ferroelectric gate film is sandwiched between the channel region and the gate electrode. In the method, a conductive barrier meterial is deposited in contact with the source region of the field effect transistor to make the Schottky diode. In reading information from the memory device, voltage is applied to a serial circuit consisting of the field effect transistor and the Schottky diode to turn the Schottky diode on.

REFERENCES:
patent: 3832700 (1974-08-01), Wu et al.
patent: 4376984 (1983-03-01), Fukushima et al.
patent: 4431305 (1984-02-01), Malaviya
patent: 4893272 (1990-01-01), Eaton, Jr. et al.
patent: 5032891 (1991-07-01), Takagi et al.
patent: 5198994 (1993-03-01), Natori
patent: 5229309 (1993-07-01), Kato
patent: 5345415 (1994-09-01), Nakao et al.
Nikkei Microdevices, Jan. 1992, p. 84.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for making a nonvolatile memory device utilizing a field does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making a nonvolatile memory device utilizing a field , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making a nonvolatile memory device utilizing a field will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-56635

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.